This text on optics for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. Its 14 case studies illustrate concepts and reinforce applications of ellipsometry a particularly in relation to the semiconductor industry and to studies involving corrosion and oxide growth. A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical constants in film, it also considers the trajectories of the ellipsometric parameters Del and Psi and how changes in materials affect parameters. This volume also addresses the use of polysilicon, a material commonly employed in the microelectronics industry, and the effects of substrate roughness. Three appendices provide helpful references.Using optical parameters similar tothose used by Irene and Doing, 6we plotthe trajectory for Figure 64 showing a trajectory for polysilicon on 1000 A of ... For this example, theindex of refractionfor the polysiliconis taken tobe A =4.0 0.05j. ... The reason that it nearly closesis due to the fact that forpolysilicon, kis very small.
|Title||:||A User's Guide to Ellipsometry|
|Author||:||Harland G. Tompkins|
|Publisher||:||Courier Corporation - 2013-03-21|